Definition
Ceramic substrates are circuit carriers formed using ceramic materials such as alumina (Al₂O₃), aluminum nitride (AlN), or silicon nitride (Si₃N₄) as the core, manufactured via thick-film/thin-film processes or direct bonding/plating technologies (e.g., DBC/DPC). Compared to traditional FR-4 or metal substrates, their key advantages include high thermal conductivity, low coefficient of thermal expansion (CTE), and stability in extreme environments.
Classification Criteria
1. By Material Type:
① Alumina Substrates (Al₂O₃): Low cost ($0.5-1.2/cm²), thermal conductivity 20-30 W/m·K, suitable for consumer electronics.
② Aluminum Nitride Substrates (AlN): High thermal conductivity (170-230 W/m·K), CTE matched to silicon chips (4.5 ppm/℃), high cost ($3-8/cm²), used in high-power devices.
③ Silicon Nitride Substrates (Si₃N₄): Flexural strength >800 MPa, excellent thermal shock resistance, ideal for EV inverters.
2. By Process Type:
① Direct Bonded Copper (DBC): Copper layer thickness 100-600 μm, capable of carrying currents >100A.
② Direct Plated Copper (DPC): Line accuracy ±10 μm, suitable for high-frequency millimeter-wave devices.
The thermal conductivity of ceramic substrates is 50-100 times higher than FR-4 (Figure 1). For example, using AlN in IGBT modules reduces junction temperature by 35-40°C, extending device lifespan by 3× (Data source: IEEE Transactions on Power Electronics).
Experimental Comparison:
Substrate Type | Thermal Conductivity (W/m·K) | Thermal Resistance (°C/W) |
FR-4 | 0.3 | 25.6 |
Al₂O₃ | 24 | 1.2 |
AlN | 180 | 0.15 |
① Flexural Strength: Si₃N₄ substrates reach 800-1000 MPa, twice that of metal substrates.
② Insulation Withstand Voltage: Al₂O₃ substrates withstand >15 kV/mm, meeting high-voltage power module requirements.
③ High-Frequency Loss: DPC substrates achieve insertion loss <0.2 dB@40 GHz, ideal for 5G base station PA modules.
Tested per MIL-STD-883:
① No delamination after 1,000 thermal cycles (-55°C to 150°C).
② Resistance variation <2% after 1,000 hours at 85°C/85% RH.
Material Selection:
①Current >50A: Prioritize DBC-AlN (Cu thickness ≥300 μm).
②Voltage >1200V: Use Al₂O₃ (dielectric strength 18 kV/mm).
Layout Optimization:
①Avoid right-angle traces; use curved transitions to minimize current crowding.
②Trace width/spacing ≥150 μm (prevents electromigration).
DPC Key Parameters:
①Surface roughness Ra <0.1 μm (reduces skin effect loss).
②Cu thickness 10-20 μm (balances conductivity and high-frequency impedance).
Grounding Design:
①Adopt coplanar waveguide (CPW) structures with impedance tolerance ±5%.
②Fill vias with silver paste to reduce inductance.
Packaging Solutions:
Use Au-Sn eutectic soldering (melting point 280°C) to prevent high-temperature failure.
Edge sealing with glass frit (hermeticity <5×10⁻³ atm·cc/s).
Copper Layer Delamination (DBC Process):
Cause: CTE mismatch-induced thermal stress.
Solution: Optimize Cu layer pre-oxidation temperature (typical 1065°C±10°C).
High-Frequency Signal Distortion:
Cause: Dielectric constant fluctuation (AlN ε_r=8.8±0.2).
Solution: Add compensation capacitors or use gradient dielectric design.
Localization Progress: China’s AlN substrate production capacity exceeded 500k units/year in 2023, with costs reduced by 30%.
① Hybrid substrate design (AlN for functional areas, Al₂O₃ for periphery).
② Laser-activated metallization (LAM) to reduce precious metal usage.
VI. Conclusion
Ceramic substrates are redefining the possibilities for high-reliability electronic systems. Engineers must balance performance and cost, from material selection to process optimization. With the rise of third-generation semiconductors (GaN/SiC), the ceramic substrate market is projected to reach $4.2 billion by 2025 (Source: Yole Développement).
(Data cited from IEEE, IMAPS, and leading supplier test reports, compliant with technical documentation standards.)